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    English: A cut exposure that is offset can distort the line ends, leading to arcing (top), and/or infringe on an adjacent line (bottom). [1][2]
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    Author Guiding light
    1. ↑ Y. Borodovsky, "EUV Lithography at Insertion and Beyond," 2012 International Workshop on EUV Lithography.
    2. ↑ L. T.-N. Wang et al., Proc. SPIE 9781, 97810B (2016).

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    Date/Time Dimensions User Comment
    2018-08-18 00:03:22 417 × 442 Guiding light
    2018-08-17 23:50:21 417 × 176 Guiding light
    2018-08-16 04:08:17 533 × 101 Guiding light Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]]

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    Date/TimeThumbnailDimensionsUserComment
    current21:25, 20 August 2019Thumbnail for version as of 21:25, 20 August 2019417 × 442 (6 KB)OgreBot(BOT): Reverting to most recent version before archival
    21:25, 20 August 2019Thumbnail for version as of 21:25, 20 August 2019417 × 176 (3 KB)OgreBot(BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2018-08-17 23:50:21 by Guiding light
    21:25, 20 August 2019Thumbnail for version as of 21:25, 20 August 2019533 × 101 (2 KB)OgreBot(BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2018-08-16 04:08:17 by Guiding light
    16:31, 20 August 2019Thumbnail for version as of 16:31, 20 August 2019417 × 442 (6 KB)Dave louis johnTransferred from en.wikipedia (MTC!) (1.1.0)

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